As MEMS design matures and migrates from process centric design to performance based design, MEMS designers would need a rational method for selecting an appropriate material that is not based on ease of processing alone. While there is a growing number of thin film materials that can be used in micromachining for MEMS devices, the selection of a particular material is rarely based on quantifiable criterion that relates directly to the optimum performance of the device. In this study, we present a methodology for creating material related device performance indices that can be used for selecting best possible material for a MEMS device. This study is inspired by the Ashby approach and its extension to the microworld in recent studies, where materials are graded on material performance indices and the most appropriate material is selected from the Ashby charts so created. We extend this concept further in this paper and create device performance indices that can be used to grade MEMS materials in performance parameter space. Nano mechanical behaviour of thin-film and surfaces has been largely studied during past years in the field of electronics industry such as MEMS, optoelectronics application, aerospace industry, iron and steel industries and also adapted in the field of biological sector that likely to grow in near future extensively. High resolution microscope and computational techniques enable the MEMS material to investigate their interfacial problems at nanoscale. In this paper, we studied the effect of mechanical properties of thin film materials, deposition process and characterization technique for MEMS.