Maruthamuthu, S (2020) Colossal photosensitive boost in Schottky diode behaviour with Ce-V2O5 interfaced layer of MIS structure. Sensors and Actuators A: Physical, 315: 112333. ISSN 09244247
Colossal photosensitive boost in Schottky diode behaviour with Ce-V2O5 interfaced layer of MIS structure.pdf - Published Version
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Abstract
In the present work, we have fabricated a highly photo responsive Schottky barrier diode based on cerium infused vanadium pentoxide thin film (Ce-V2O5) as a interfacial layer. It was coated on a glass slide by low-cost sol-gel spin-coating technique and annealed at 500 °C. Structure, surface morphology, optical and electrical characteristic of Ce infused V2O5 films with different Ce concentrations viz 0, 2, 4 and 6 wt% were investigated. X-ray diffraction (XRD) pattern exposed that all coated films are tetragonal structure. And a peak shift was recorded after doping Ce ion into the V2O5 system. FE-SEM images showed a smooth nanorods and nanoplate-like structures in nano-scale region. Topology view by AFM showed a significant decrease in surface roughness of the film at different wt.% of Ce. The incorporation of Ce concentration based on the optical absorbance and band gap energy were studied, using UV–vis spectroscopy. Current-voltage (I–V), characteristics, photo-diode parameters of the Cu/Ce-V2O5/n-Si diodes were evaluated under dark and light exposed conditions. A maximum quantum efficiency of 25.54 % was achieved for the MIS diode fabricated with 6 % of Ce. The photosensitivity of the Cu/Ce-V2O5/n-Si diode 100 times higher than pure diode. Photodiode parameters and I–V analysis revealed that Ce with 6 wt.% is appropriate for the development of high quality photodiode and photo detector applications based to its electrical-performance.
Item Type: | Article |
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Subjects: | F Mechanical Engineering > Morphology J Physics > Thin films J Physics > Semiconductors |
Divisions: | Physics |
Depositing User: | Dr Krishnamurthy V |
Date Deposited: | 02 Sep 2024 11:04 |
Last Modified: | 02 Sep 2024 11:04 |
URI: | https://ir.psgitech.ac.in/id/eprint/1025 |